Semiconductor device and manufacture method thereof

Details Semiconductor device and manufacture method thereof Semiconductor device and manufacture method thereof

2009-07-09

2010-06-29

Hoang, Quoc D (Department: 2892)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S164000, C257SE21094, C257SE21104

Reexamination Certificate

active

07745269

ABSTRACT:
An object is to provide an element structure of a semiconductor device for increasing an etching margin for various etching steps and a method for manufacturing the semiconductor device having the element structure. An island-shaped semiconductor layer is provided over an insulator having openings. The island-shaped semiconductor layer includes embedded semiconductor layers and a thin film semiconductor layer. The embedded semiconductor layers have a larger thickness than that of the thin film semiconductor layer.

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