Semiconductor device and manufacture method thereof

Details Semiconductor device and manufacture method thereof Semiconductor device and manufacture method thereof

2008-02-15

2009-08-04

Hoang, Quoc D (Department: 2892)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C438S149000, C257SE27100, C257SE51005, C257SE29151

Reexamination Certificate

active

07569886

ABSTRACT:
An object is to provide an element structure of a semiconductor device for increasing an etching margin for various etching steps and a method for manufacturing the semiconductor device having the element structure. An island-shaped semiconductor layer is provided over an insulator having openings. The island-shaped semiconductor layer includes embedded semiconductor layers and a thin film semiconductor layer. The embedded semiconductor layers have a larger thickness than that of the thin film semiconductor layer.

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