Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S173000, C257S356000, C257S360000, C257S363000, C257SE29015, C257SE29008, C438S155000

Reexamination Certificate

active

07898035

ABSTRACT:
A semiconductor device has a silicon substrate, an external connection terminal disposed on the silicon substrate, an internal circuit region disposed on the silicon substrate, an NMOS transistor for electrostatic discharge protection provided between the external connection terminal and the internal circuit region, and a wiring connecting together the external connection terminal and the NMOS transistor and connecting together the NMOS transistor and the internal circuit region. The NMOS transistor has a drain region and a gate electrode whose potential is fixed to a ground potential. The external connection terminal is smaller than the drain region and is formed above the drain region.

REFERENCES:
patent: 5910675 (1999-06-01), Horiguchi et al.
patent: 6940131 (2005-09-01), Baldwin et al.
patent: 2005/0023692 (2005-02-01), Matsunaga et al.
patent: 2005/0041169 (2005-02-01), Hashimoto et al.
patent: 2005/0077551 (2005-04-01), Halamik et al.
patent: 2005/0224883 (2005-10-01), Huang et al.
patent: 2007/0034960 (2007-02-01), Zhang et al.
patent: 2007/0235809 (2007-10-01), Hayano
patent: 2009/0152633 (2009-06-01), Takasu et al.
Patent Abstracts of Japan, publication No. 07-045829, publication date Feb. 14, 1995.

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