Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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Details

C257S329000, C257S282000, C257S283000, C257SE29201, C257SE29257, C438S270000

Reexamination Certificate

active

07943991

ABSTRACT:
A semiconductor device is discloses that includes an n-type semiconductor substrate; an alternating conductivity type layer on semiconductor substrate, the alternating conductivity type layer including n-type drift regions and p-type partition regions arranged alternately; p-type channel regions on the alternating conductivity type layer; and trenches formed from the surfaces of the p-type channel regions down to respective n-type drift regions. The bottom of each trench is over the pn-junction between the p-type partition region and the n-type drift region. The semiconductor device facilitates preventing the on-resistance from increasing, obtaining a higher breakdown voltage, and reducing the variations caused in the characteristics thereof.

REFERENCES:
patent: 4316203 (1982-02-01), Tohgei
patent: 2000-260984 (2000-09-01), None
patent: 2001-332726 (2001-11-01), None
patent: 2002-76339 (2002-03-01), None
patent: 2002-184985 (2002-06-01), None
patent: 2003-124464 (2003-04-01), None
patent: 2004-200441 (2004-07-01), None
patent: 2005-19528 (2005-01-01), None

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