Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Test or calibration structure

Reexamination Certificate

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Details

C438S014000, C257SE27111, C257SE27113

Reexamination Certificate

active

07947979

ABSTRACT:
An object of the invention is to manage variation of electrical characteristics of an element in a semiconductor device due to a vapor deposition process by measuring electrical characteristics of a TEG. A substrate100of an active matrix EL panel includes a vapor deposition region101having a film formed by a vapor deposition method. In the vapor deposition region101, a pixel region102is provided. A TEG109is provided in the vapor deposition region101having a film formed in a vapor deposition step and outside of the pixel region102. A measurement terminal portion110for measuring the TEG109is provided outside of a sealing region103.

REFERENCES:
patent: 5754158 (1998-05-01), Misawa et al.
patent: 6188453 (2001-02-01), Matsuoka et al.
patent: 6670953 (2003-12-01), Ozawa
patent: 6887724 (2005-05-01), Nakamura et al.
patent: 2004/0018677 (2004-01-01), Nakanishi et al.
patent: 2005/0095735 (2005-05-01), Fujita
patent: 2005/0157243 (2005-07-01), Hayata et al.
patent: 2005/0196883 (2005-09-01), Asano et al.
patent: 2006/0270073 (2006-11-01), Isobe
patent: 2007/0018680 (2007-01-01), Jeon et al.
patent: 2004-341216 (2004-12-01), None

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