Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2008-04-28
2011-10-11
Smith, Bradley K (Department: 2894)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257SE29260
Reexamination Certificate
active
08035158
ABSTRACT:
Aiming at realizing high breakdown voltage and low ON resistance of a semiconductor device having the super-junction structure, the semiconductor device of the present invention has a semiconductor substrate having an element forming region having a gate electrode formed therein, and a periphery region formed around the element forming region, and having an field oxide film formed therein; and a parallel p-n layer having n-type drift regions and p-type column regions alternately arranged therein, formed along the main surface of the semiconductor substrate, as being distributed over the element forming region and a part of the periphery region, wherein the periphery region has no column region formed beneath the end portion on the element forming region side of the field oxide film and has p-type column regions as at least one column region formed under the field oxide film.
REFERENCES:
patent: 6621132 (2003-09-01), Onishi et al.
patent: 2004/0065921 (2004-04-01), Iwamoto et al.
patent: 2005/0181577 (2005-08-01), Hshieh
patent: 2004-022716 (2004-01-01), None
Miura Yoshinao
Ninomiya Hitoshi
Movva Amar
Renesas Electronics Corporation
Smith Bradley K
Young & Thompson
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