Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate
2006-12-26
2010-06-01
Nguyen, Dao H (Department: 2818)
Active solid-state devices (e.g., transistors, solid-state diode
Field effect device
Having insulated electrode
C257S288000, C257S328000, C257S333000, C257S396000, C257SE21384, C257SE21410, C257SE21419, C257SE29321, C438S258000, C438S259000, C438S261000, C438S270000, C438S271000
Reexamination Certificate
active
07728380
ABSTRACT:
Embodiments relate to a semiconductor device. In embodiments, a semiconductor device may include a semiconductor substrate having isolation layers and a well region, a gate electrode formed within a trench having a predetermined depth in the well region, source/drain regions formed at both sides of the trench, respectively, an interlayer dielectric layer formed on the semiconductor substrate to have predetermined contact holes, and metal interconnections formed within the contact holes, respectively.
REFERENCES:
patent: 5473176 (1995-12-01), Kakumoto
patent: 6642130 (2003-11-01), Park
patent: 6916745 (2005-07-01), Herrick et al.
patent: 7259411 (2007-08-01), Hopper et al.
patent: 7368778 (2008-05-01), Lee et al.
patent: 2004/0224476 (2004-11-01), Yamada et al.
Dongbu HiTek Co., Ltd
Nguyen Dao H
Sherr & Vaughn, PLLC
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