Semiconductor device manufacturing: process – Coating with electrically or thermally conductive material – To form ohmic contact to semiconductive material
Reexamination Certificate
2007-12-17
2010-11-30
Smith, Matthew S (Department: 2823)
Semiconductor device manufacturing: process
Coating with electrically or thermally conductive material
To form ohmic contact to semiconductive material
C438S637000, C438S598000, C257SE21585, C257SE21597
Reexamination Certificate
active
07842610
ABSTRACT:
A through-electrode that penetrates a semiconductor substrate and that is insulatively separated from the semiconductor substrate includes an inner through-electrode, a quadrangular ring-shaped semiconductor, and an outer peripheral through-electrode. The quadrangular ring-shaped semiconductor is formed around the inner through-electrode, and the outer peripheral through-electrode is formed around the quadrangular ring-shaped semiconductor.
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Japanese Patent Office issued a Japanese Office Action dated Apr. 28, 2010, Application No. 2005-077050.
Elpida Memory Inc.
Jefferson Quovaunda
Smith Matthew S
Young & Thompson
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