Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE21435

Reexamination Certificate

active

11145939

ABSTRACT:
The semiconductor device comprises: a semiconductor substrate (N+substrate110) containing a first conductivity type impurity implanted therein; a second conductivity type impurity-implanted layer (P+implanted layer114) at relatively high concentration, formed on the semiconductor substrate (N+substrate110); a second conductivity type impurity epitaxial layer (P−epitaxial layer111) at relatively low concentration, formed on the second conductivity type impurity-implanted layer (P+implanted layer114); and a field effect transistor100(N-channel type lateral MOSFET100) composed of a pair of impurity diffusion regions (N+source diffusion layer115and N−drain layer116) provided in the second conductivity type impurity epitaxial layer (P−epitaxial layer111) and a gate electrode117provided over a region sandwiched with the pair of impurity diffusion regions (N+source diffusion layer115and N−drain layer116).

REFERENCES:
patent: 5637889 (1997-06-01), Groover et al.
patent: 6552390 (2003-04-01), Kameda
patent: 6614077 (2003-09-01), Nakamura et al.
patent: 6768173 (2004-07-01), Hebert
patent: 2002/0084489 (2002-07-01), Yamamoto
patent: 2002-343960 (2002-11-01), None
patent: 2004-63922 (2004-02-01), None
Wolf S. “Silicon Processing for the VLSI Era”, Lattice Press, vol. 2, p. 318.

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