Semiconductor device

Details Semiconductor device Semiconductor device

2007-10-09

2007-10-09

Cao, Phat X. (Department: 2814)

Active solid-state devices (e.g., transistors, solid-state diode

Gate arrays

Having specific type of active device

C257S206000, C257S369000, C257SE27064

Reexamination Certificate

active

11148208

ABSTRACT:
A semiconductor device includes a semiconductor substrate; a diffusion region which is formed in the semiconductor substrate and serves as a region for the formation of a MIS transistor; an element isolation region surrounding the diffusion region; at least one gate conductor film which is formed across the diffusion region and the element isolation region, includes a gate electrode part located on the diffusion region and a gate interconnect part located on the element isolation region, and has a constant dimension in the gate length direction; and an interlayer insulating film covering the gate electrode. The semiconductor device further includes a gate contact which passes through the interlayer insulating film, is connected to the gate interconnect part, and has the dimension in the gate length direction larger than the gate interconnect part.

REFERENCES:
patent: 5420447 (1995-05-01), Waggoner
patent: 5498897 (1996-03-01), Komatsuzaki et al.
patent: 5847421 (1998-12-01), Yamaguchi
patent: 08-272075 (1996-10-01), None
patent: 10-032253 (1998-02-01), None
patent: 2002-026125 (2002-01-01), None

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