Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S302000

Reexamination Certificate

active

06853026

ABSTRACT:
A semiconductor device in which an electrode is not allowed to easily deform even when a heat treatment is performed on a material forming the electrode during a damascene process for forming a stacked capacitor, and a manufacturing method thereof are provided. A conductive film5made of the same material as that of a capacitor lower electrode6is formed so as to be adhered to a top face of a conductive film4by a heat treatment. If the lower electrode6is made of a noble metal such as ruthenium, for example, the conductive film5is made of the same noble metal. Because of use of the same material for forming the conductive film5and the lower electrode6, connection between the conductive film5and the lower electrode6is strengthened. Accordingly, it is easy to maintain connection between the conductive film5and the lower electrode6during a heat treatment on the lower electrode6, so that the lower electrode is not likely to deform. For this reason, connection between the conductive plug4and the lower electrode6can be made more reliable than a structure in which the lower electrode6is connected directly to the conductive plug4.

REFERENCES:
patent: 6235603 (2001-05-01), Melnick et al.
patent: 6384443 (2002-05-01), Tsunemine
patent: 20020135010 (2002-09-01), Sheu et al.
patent: 101 30 626 (2001-06-01), None
patent: 8-330538 (1996-12-01), None
patent: 2001-210803 (2001-08-01), None
H. Itoh, et al., Symposium on VLSI Technology Digest of Technical Papers, pp. 106-107, “a New Cell Technology for the Scalable BST Capacitor Using Damascene-Formed Pedestal Electrode with a [Pt-Ir] Alloy Coating”, 2000.

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