Semiconductor device

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257S340000, C257S341000

Reexamination Certificate

active

06977414

ABSTRACT:
A semiconductor device comprises: a semiconductor layer of a first conductivity type; a pair of base regions of a second conductivity type selectively provided on a surface of the semiconductor layer; and source regions of a first conductivity type, each of the source regions being selectively provided on a surface of each of the base regions. The semiconductor device further comprises an electrical field reducing region of a second conductivity type selectively provided on the surface of the semiconductor layer between the pair of the base regions; a gate insulating film provided on the surface of the base regions; a pair of gate electrodes provided on the gate insulating film, each of the gate electrodes being provided on the surface of the base regions between the source region and the electrical field reducing region; and a source electrode connected to the source regions. The electrical field reducing region is isolated from both of the gate electrode and the source electrode.

REFERENCES:
patent: 4199774 (1980-04-01), Plummer
patent: 4414560 (1983-11-01), Lidlou
patent: 4455565 (1984-06-01), Goodman et al.
patent: 5798554 (1998-08-01), Grimaldi et al.
patent: 2001-156294 (2001-06-01), None
T. Sakai, et al., IEEE Transactions on Electron Devices, vol. 36, No. 7, pp. 1381-1386, “A New Vdmosfet Structure with Reduced Reverse Transfer Capacitance”, Jul. 1989.

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