Semiconductor constructions having multiple patterned...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

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C257SE21409

Reexamination Certificate

active

07898019

ABSTRACT:
Some embodiments include methods of forming a NAND cell unit having a NAND string gate closest to a select gate with a different width than other NAND string gates more distant from the select gate. Some embodiments include utilization of an etch comprising HBr and O2to extend a pattern through a carbon-containing layer. The patterned carbon-containing layer may be used to pattern NAND cell unit gates. Some embodiments include structures having a patterned carbon-containing layer defining a NAND cell unit having a NAND string gate closest to a select gate with a different width than other NAND string gates more distant from the select gate.

REFERENCES:
patent: 6240012 (2001-05-01), Nakamura et al.
patent: 6307784 (2001-10-01), Hamilton et al.
patent: 6951790 (2005-10-01), Violette
patent: 7112488 (2006-09-01), Helm et al.
patent: 7344942 (2008-03-01), Korber
patent: 2003/0127682 (2003-07-01), Lee et al.
patent: 2005/0059262 (2005-03-01), Yin et al.
patent: 2005/0099847 (2005-05-01), Ichige et al.
patent: 2005/0281092 (2005-12-01), Lindsay
patent: 2006/0043456 (2006-03-01), Derderian et al.
patent: 2006/0226471 (2006-10-01), Lindsay et al.
patent: 2006/0267075 (2006-11-01), Sandhu et al.
patent: 2007/0004140 (2007-01-01), Jang et al.
patent: 2007/0072435 (2007-03-01), Kumar
patent: 2007/0210372 (2007-09-01), Park et al.
patent: 2008/0003754 (2008-01-01), Jeong et al.

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