Self-topcoating photoresist for photolithography

Details Self-topcoating photoresist for photolithography Self-topcoating photoresist for photolithography

2011-05-31

2011-05-31

Lee, Sin J. (Department: 1722)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S907000, C430S910000, C430S326000, C430S311000, C430S330000, C430S313000, C526S242000, C526S245000

Reexamination Certificate

active

07951524

ABSTRACT:
Photoresist additive polymers and photoresist formulations that can be used in immersion lithography without the use of an additional topcoat. The resist compositions include a photoresist polymer, at least one photoacid generator, a solvent; and a photoresist additive polymer. Also a method of forming using photoresist formulations including photoresist additive polymers.

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