Etching a substrate: processes – Etching of semiconductor material to produce an article...
Patent
1996-04-10
1998-05-19
Powell, William
Etching a substrate: processes
Etching of semiconductor material to produce an article...
216 18, 216 41, H01L 2100, B44C 122, C23F 100
Patent
active
057531285
ABSTRACT:
Detector of the filament type for determining a static or dynamic characteristic of an ambient medium, constituted by a resistive component intended to be heated by the Joule effect in the medium, and an interface process region suitable for reacting with the medium by a physico-chemical with an effect, depending on the characteristic to be determined, on the electrical characteristic of the interface region, in which there is a supporting member through which there is at least one aperture and at least one filament including the resistive component, composed of one or more thin films and a central portion located in the aperture and end portions via which the central portion is connected to the supporting member.
REFERENCES:
patent: 4544441 (1985-10-01), Hartmann et al.
Accorsi Antoinette
Charlot Daniel
Commissariat al'Energie Atomique
Institut National De L'Environnement Industriel Et Des Risque
Powell William
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