Self-supporting thin-film filament detector, process for its man

Etching a substrate: processes – Etching of semiconductor material to produce an article...

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

216 18, 216 41, H01L 2100, B44C 122, C23F 100

Patent

active

057531285

ABSTRACT:
Detector of the filament type for determining a static or dynamic characteristic of an ambient medium, constituted by a resistive component intended to be heated by the Joule effect in the medium, and an interface process region suitable for reacting with the medium by a physico-chemical with an effect, depending on the characteristic to be determined, on the electrical characteristic of the interface region, in which there is a supporting member through which there is at least one aperture and at least one filament including the resistive component, composed of one or more thin films and a central portion located in the aperture and end portions via which the central portion is connected to the supporting member.

REFERENCES:
patent: 4544441 (1985-10-01), Hartmann et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Self-supporting thin-film filament detector, process for its man does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Self-supporting thin-film filament detector, process for its man, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-supporting thin-film filament detector, process for its man will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1849719

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.