Self-repair and enhancement of nanostructures by...

Details Self-repair and enhancement of nanostructures by... Self-repair and enhancement of nanostructures by...

2007-10-16

2007-10-16

Smoot, Stephen W. (Department: 2813)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

Utilizing reflow

C438S799000, C977S888000

Reexamination Certificate

active

11442900

ABSTRACT:
In accordance with the invention, the structure of a patterned nanoscale or near nanoscale device (“nanostructure”) is repaired and/or enhanced by liquifying the patterned device in the presence of appropriate guiding conditions for a period of time and then permitting the device to solidify. Advantageous guiding conditions include adjacent spaced apart or contacting surfaces to control surface structure and preserve vertically. Unconstrained boundaries to permit smoothing of edge roughness. In an advantageous embodiment, a flat planar surface is disposed overlying a patterned nanostructure surface and the surface is liquified by a high intensity light source to repair or enhance the nanoscale features.

REFERENCES:
patent: 5772905 (1998-06-01), Chou
patent: 6755984 (2004-06-01), Lee et al.
patent: 2004/0087186 (2004-05-01), Brask
patent: 2004/0192041 (2004-09-01), Jeong et al.
patent: 2005/0269745 (2005-12-01), Cherala et al.
International Search Report and Written Opinion PCT/US06/20686, May 29, 2006.

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