Self protecting NLDMOS, DMOS and extended voltage NMOS devices

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE29021, C438S286000, C438S586000

Reexamination Certificate

active

07411251

ABSTRACT:
In an NLDMOS, DMOS or NMOS active device the ability to withstand snapback under stress conditions is provided by moving the hot spot away from the drain contact region. This is achieved by moving the drain contact region further away from the gate and including an additional n-region next to the drain or an additional floating p-region next to the drain.

REFERENCES:
patent: 5508547 (1996-04-01), Yang
patent: 5592005 (1997-01-01), Floyd et al.
patent: 5767550 (1998-06-01), Calafut et al.
patent: 5804860 (1998-09-01), Amerasekera
patent: 6589833 (2003-07-01), Hu et al.
patent: 6657241 (2003-12-01), Rouse et al.
patent: 7057215 (2006-06-01), Vashchenko et al.
patent: 7115951 (2006-10-01), Vashchenko et al.
patent: 2002/0076876 (2002-06-01), Ker et al.
patent: 2004/0173859 (2004-09-01), Hao et al.
patent: 2006/0186467 (2006-08-01), Pendharkar et al.
patent: 2006/0202265 (2006-09-01), Xu et al.
patent: 2006/0284258 (2006-12-01), Huang et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Self protecting NLDMOS, DMOS and extended voltage NMOS devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Self protecting NLDMOS, DMOS and extended voltage NMOS devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self protecting NLDMOS, DMOS and extended voltage NMOS devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4010489

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.