Self-cleaning focus ring

Details Self-cleaning focus ring Self-cleaning focus ring

1997-05-01

1999-08-24

Kunemund, Robert

Coating apparatus

Gas or vapor deposition

With treating means

156345, 118723R, 118723I, 118723MP, C23C 1600, C23F 102

Patent

active

059420391

ABSTRACT:
An electrically activated focus ring (90) for plasma processing a substrate (25) in a plasma zone comprises a dielectric barrier (92) with a plasma focusing surface (95) for focusing the plasma onto the substrate surface, and an opposing surface (98). The focus ring (90) comprises an electrical conductor element (100) abutting at least a portion of the opposing surface (98) of the dielectric barrier (92). The conductor element (100) is electrically isolated from the plasma and capable of being electrically charged to attract the plasma to reduce formation of deposits on the plasma focusing surface (95) of the dielectric barrier (92).

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