Self-apodizing collimator for x-ray lithography

Details Self-apodizing collimator for x-ray lithography Self-apodizing collimator for x-ray lithography

1992-08-28

1994-07-26

Church, Craig E.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 84, 378 85, 378147, G21K 500

Patent

active

053331664

ABSTRACT:
A self-apodizing collimator for collimating X-rays for use in VLSI lithography. The paraboloidal collimator uses a graded ML coating to collimate a range of wavelengths along the surface of the paraboloid such that a uniform resist response is provided. In addition, the collimated X-rays have a higher intensity than possible with a system using additional apodizing films.

REFERENCES:
patent: 4727000 (1988-02-01), Ovshinsky et al.
patent: 5214685 (1993-05-01), Howells

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