Self-aligned pole trim process

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C427S128000, C427S130000, C427S131000, C427S132000, C427S331000

Reexamination Certificate

active

06887355

ABSTRACT:
A method for forming a trimmed upper pole piece for a magnetic write head, said pole piece having a uniform width above and below a write gap layer. Prior art methods of trimming pole pieces to a final width using ion-beam etches produce pole pieces with thickness differentials due to the etch resistant nature of the alumina write-gap filling material. The present method uses NiCr, NiFeCr or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant.

REFERENCES:
patent: 5874010 (1999-02-01), Tao et al.
patent: 5878481 (1999-03-01), Feng et al.
patent: 5901432 (1999-05-01), Armstrong et al.
patent: 6141183 (2000-10-01), Wu et al.
patent: 6243939 (2001-06-01), Chen et al.
patent: 6385008 (2002-05-01), Santini et al.
patent: 6696226 (2004-02-01), Dinan et al.
patent: 6737281 (2004-05-01), Dang et al.
patent: 6778357 (2004-08-01), Tabakovic et al.
patent: 20010005301 (2001-06-01), Komuro et al.
patent: 20030179498 (2003-09-01), Hsiao et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Self-aligned pole trim process does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Self-aligned pole trim process, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-aligned pole trim process will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3375393

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.