Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-05-03
2005-05-03
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C427S128000, C427S130000, C427S131000, C427S132000, C427S331000
Reexamination Certificate
active
06887355
ABSTRACT:
A method for forming a trimmed upper pole piece for a magnetic write head, said pole piece having a uniform width above and below a write gap layer. Prior art methods of trimming pole pieces to a final width using ion-beam etches produce pole pieces with thickness differentials due to the etch resistant nature of the alumina write-gap filling material. The present method uses NiCr, NiFeCr or Ru as write gap filling materials which have an etch rate which is substantially equal to the etch rate of the other layers forming the pole piece and are highly corrosion resistant.
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Chen Mao-Min
Han Cherng-Chyi
Liu Fenglin
Ackerman Stephen B.
Headway Technologies Inc.
Saile George O.
Versteeg Steven
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