Self-aligned pattern over a reflective layer

Details Self-aligned pattern over a reflective layer Self-aligned pattern over a reflective layer

1996-06-11

1999-08-10

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430315, G03F 700

Patent

active

059357630

ABSTRACT:
An opening in an insulator on a substrate is self-aligned to a reflective region on the substrate. The opening is formed by shining blanket radiation on photoresist on the insulator and developing to open the resist and insulator. The resist region that is above the reflective region absorbs both incident and reflected radiation, a larger total dose of radiation than is absorbed by resist above non-reflective regions. The incident dose is adjusted to provide a below threshold dose everywhere except to those regions of resist that are above highly reflective regions.

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"Semiconductor Lithography Principles, Practices, and Materials", Wayne M. Moreau, Microdevices Physics and Fabriction Technologies, Plenum Press, 1987.

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