Self-aligned charge screen (SACS) field effect transistors and m

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257336, 257345, 257401, 437 40, H01L 2976, H01L 21265

Patent

active

055369596

ABSTRACT:
A field effect transistor includes a pair of buried centroid regions in a semiconductor substrate at a predetermined depth from the substrate face and having a doping concentration opposite the source and drain regions. A gradient region surrounds each of the pair of buried centroid regions. The gradient regions have decreasing doping concentration in all directions away from the associated centroid region. Source and drain extension regions may also be provided. The buried centroid/gradient regions operate to screen charge on the source and drain regions facing the channel to prevent this charge from interacting with the channel. Short channel effects are thereby reduced or minimized. The threshold voltage of the device can also be adjusted without the need for threshold adjusting implants. The buried centroid/gradient regions and source and drain extension regions may be fabricated in a self-aligned process using the gate and gate sidewall spacers as a mask.

REFERENCES:
patent: 4636822 (1987-01-01), Codella et al.
patent: 4656492 (1987-04-01), Sunami et al.
patent: 4703551 (1987-11-01), Szluk et al.
patent: 4837173 (1989-06-01), Alvis et al.
patent: 4928156 (1990-05-01), Alvis et al.
patent: 4956311 (1990-09-01), Liou et al.
patent: 5031008 (1991-07-01), Yoshida
patent: 5040037 (1991-08-01), Yamaguchi et al.
patent: 5108940 (1992-04-01), Williams
patent: 5219777 (1993-06-01), Kang
patent: 5243212 (1993-09-01), Williams
patent: 5244823 (1993-09-01), Adan
patent: 5264380 (1993-11-01), Pfiester
patent: 5290714 (1994-03-01), Onozawa
patent: 5359221 (1994-10-01), Miyamoto et al.
Zhi-Hong Liu, et al., Threshold Voltage Model for Deep-Submicrometer MOSFET's, IEEE Transactions on Electron Devices, vol. 40, No. 1, Jan. 1993, pp. 86-95.
Yoshinori Okumura, et al., Source-to-Drain Nonuniformly Doped Channel (NUDC) MOSFET Structures for High Current Drivability and Threshold Voltage Controllability, IEEE Transactions on Electron Devices, vol. 39, No. 11, Nov. 1992, pp. 2541-2552.
James E. Chung, et al., Performance and Reliability Design Issues for Deep-Submicrometer MOSFETS, IEEE Transactions on Electron Devices, vol. 38, No. 3, Mar. 1991, pp. 545-554.
Eiji Takeda, et al., Constraints on the Application of 0.5-.mu.m MOSFET's to ULSI Systems, IEEE Transactions on Electron Devices, vol. ED-32, No. 2 Feb. 1985, pp. 322-327.
J. R. Brews, et al., Generalized Guide for MOSFET Miniaturization, IEEE Electron Device Letters, vol. EDL-1, No. 1, Jan 1980.
Hisayo Sasaki, et al., Hot-Carrier Induced Drain Leakage Current in N-Channel MOSFET, IEEE, 1987, pp. 726-729.
T. Y. Chan, et al., The Impact of Gate-Induced Drain Leakage Current on MOSFET Scaling, IEEE, 1987, pp. 718-721.
Chi Chang, et al., Corner-Field Induced Drain Leakage in Thin Oxide MOSFETs, IEEE, 1987.
Christopher F. Codella, et al., Halo Doping Effects in Submicron DI-LDD Device Design, IEEE, 1985, pp. 230-233.
John R. Brews, Threshold Shifts Due to Nonuniform Doping Profiles in Surface Channels MOSFET's, IEEE Transactions on Electron Devices, vol. ED-26, No. 11, Nov. 1979.
W. Fichtner, et al., MOS modelling by analytical approximations, Int. J. Electronics, vol. 46, No. 1, 1979, pp. 33-55.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Self-aligned charge screen (SACS) field effect transistors and m does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Self-aligned charge screen (SACS) field effect transistors and m, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Self-aligned charge screen (SACS) field effect transistors and m will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1786407

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.