Selectively deposited silicon oxide layers on a silicon...

Details Selectively deposited silicon oxide layers on a silicon... Selectively deposited silicon oxide layers on a silicon...

2007-05-08

2007-05-08

Pert, Evan (Department: 2826)

Active solid-state devices (e.g., transistors, solid-state diode

Field effect device

Having insulated electrode

C257S369000, C257S412000

Reexamination Certificate

active

10925865

ABSTRACT:
A process for selectively depositing a silicon oxide layer onto silicon substrates of different conductivity types is disclosed. The silicon oxide layer is formed by the ozone decomposition of TEOS at relatively low temperatures and relatively high pressures. Use of the process to produce layers, spacers, memory units, and gates is also disclosed, as well as the structures so produced.

REFERENCES:
patent: 4470852 (1984-09-01), Ellsworth
patent: 4717678 (1988-01-01), Goth
patent: 5320975 (1994-06-01), Cederbaum et al.
patent: 5399513 (1995-03-01), Liou et al.
patent: 5665644 (1997-09-01), Sandhu
patent: 5851900 (1998-12-01), Chu et al.
patent: 5855957 (1999-01-01), Yuan
patent: 5882993 (1999-03-01), Gardner et al.
patent: 6050506 (2000-04-01), Guo et al.
patent: 6051881 (2000-04-01), Klein et al.
patent: 6090693 (2000-07-01), Gonzalez et al.
patent: 6121086 (2000-09-01), Kuroda et al.
patent: 6121651 (2000-09-01), Furukawa et al.
patent: 6149974 (2000-11-01), Nguyen et al.
patent: 6368986 (2002-04-01), Budge et al.
patent: 6387764 (2002-05-01), Curtis
patent: 6503851 (2003-01-01), Budge et al.
patent: 6569742 (2003-05-01), Taniguchi et al.
patent: 6602807 (2003-08-01), Budge et al.
patent: 6617230 (2003-09-01), Budge et al.
patent: 6821854 (2004-11-01), Kanda et al.
patent: 2004/0029402 (2004-02-01), Budge et al.
patent: 406283526 (1994-10-01), None

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