Selective processing using a hydrocarbon and hydrogen

Details Selective processing using a hydrocarbon and hydrogen Selective processing using a hydrocarbon and hydrogen

1994-08-01

1995-12-26

Nguyen, Nam

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

437228, 20419235, H01L 2100, H01L 21465

Patent

active

054784379

ABSTRACT:
A layer is plasma etched or deposited with a gaseous mixture of a hydrocarbon, hydrogen and a noble gas. A cathode DC bias of greater than 600 V is used. This cathode DC bias allows for selectively etching a III-V material over an aluminum containing layer or for the deposition of a hydrogenated carbon film.

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