Selective etching of polymeric materials embodying silicones via

Details Selective etching of polymeric materials embodying silicones via Selective etching of polymeric materials embodying silicones via

1978-10-18

1980-06-24

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 156653, 156657, 156662, 204192E, 252 791, H01L 21306, B44C 122, C03C 1500, C03C 2506

Patent

active

042093562

ABSTRACT:
Silicon is employed as a masking material for the selective plasma chemical etching of a coating material of a polyimide-silicone copolymer disposed on selective surface areas of electronic devices.

REFERENCES:
patent: 3586554 (1971-06-01), Couture et al.
patent: 3816198 (1974-06-01), LaCombe
patent: 3994817 (1976-11-01), Quintana
patent: 4140572 (1979-02-01), Stein

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