Selective dry etching of substrates

Details Selective dry etching of substrates Selective dry etching of substrates

1977-12-20

1979-01-02

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156659, 156667, 156904, 204192EC, 204192E, C23F 102

Patent

active

041325869

ABSTRACT:
Magnesium oxide is deposited on a substrate as a mask with a pattern of openings which exposes a corresponding pattern of a surface of a substrate which is to be subjected to dry etching.
In a specific application, the magnesium oxide mask is employed to delineate a conductor pattern on semiconductor substrates by dry etching.

REFERENCES:
patent: 3455020 (1969-07-01), Dawson et al.
patent: 3794536 (1974-02-01), Muska
patent: 4004044 (1977-01-01), Franco et al.
patent: 4008111 (1977-02-01), Rutz

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