Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Reexamination Certificate
2005-04-26
2005-04-26
Versteeg, Steven (Department: 1753)
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
C427S595000, C427S598000, C427S130000, C427S131000, C427S383100, C427S372200
Reexamination Certificate
active
06884328
ABSTRACT:
Magnetic films are annealed by radio frequency (RF) radiation. During the RF annealing process, the layers may be subjected to a magnetic field in order to control their anisotropy axes. The RF annealed layers are useful for applications such as longitudinal and perpendicular magnetic recording layers of magnetic data storage media.
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Khizroev Sakhrat
Litvinov Dmitri
Shukla Nisha
Svedberg Erik Bjorn
Weller Dieter K.
Pietragallo Bosick & Gordon
Seagate Technology LLC
Towner, Esq. Alan G.
Versteeg Steven
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