Selective and precise etching and plating of conductive substrat

Details Selective and precise etching and plating of conductive substrat Selective and precise etching and plating of conductive substrat

1991-03-01

1993-04-13

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430311, 430313, 430319, 2041802, 2041086, 2041811, G03C 500

Patent

active

052022226

ABSTRACT:
Method for selective and precise etching and plating of a conductive substrate through electrophoretic deposition of a photoresist composition. The invention enables chemical milling and plating of products useful in high performance applications such as lead frames with lead widths less than 1.0 mil and precisely plated lead faces.

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