Selecting a hypothetical profile to use in optical metrology

Details Selecting a hypothetical profile to use in optical metrology Selecting a hypothetical profile to use in optical metrology

2008-07-01

2008-07-01

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

Dimension

C356S445000, C356S237200, C356S237500

Reexamination Certificate

active

10663300

ABSTRACT:
A hypothetical profile is used to model the profile of a structure formed on a semiconductor wafer to use in determining the profile of the structure using optical metrology.To select a hypothetical profile, sample diffraction signals are obtained from measured diffraction signals of structures formed on the wafer, where the sample diffraction signals are a representative sampling of the measured diffraction signals. A hypothetical profile is defined and evaluated using a sample diffraction signal from the obtained sample diffraction signals.

REFERENCES:
patent: 5963329 (1999-10-01), Conrad et al.
patent: 6591405 (2003-07-01), Doddi
patent: 6785638 (2004-08-01), Niu
patent: 6891626 (2005-05-01), Niu
patent: 6943900 (2005-09-01), Niu et al.
patent: 6952818 (2005-10-01), Ikeuchi
patent: 7092110 (2006-08-01), Balasubramanian
patent: 2004/0017574 (2004-01-01), Vuong
patent: 2004/0017575 (2004-01-01), Balasubramanian et al.
patent: 2004/0267397 (2004-12-01), Doddi
patent: 2001337047 (2001-07-01), None
patent: 2003059991 (2003-02-01), None

Affiliated with

Also associated with

Rating

Selecting a hypothetical profile to use in optical metrology does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Selecting a hypothetical profile to use in optical metrology, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Selecting a hypothetical profile to use in optical metrology will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3933414