Selecting a hypothetical profile to use in optical metrology

Details Selecting a hypothetical profile to use in optical metrology Selecting a hypothetical profile to use in optical metrology

2008-07-01

2008-07-01

Lauchman, Layla G. (Department: 2877)

Optics: measuring and testing

Dimension

C356S445000, C356S237200, C356S237500

Reexamination Certificate

active

07394554

ABSTRACT:
A hypothetical profile is used to model the profile of a structure formed on a semiconductor wafer to use in determining the profile of the structure using optical metrology.To select a hypothetical profile, sample diffraction signals are obtained from measured diffraction signals of structures formed on the wafer, where the sample diffraction signals are a representative sampling of the measured diffraction signals. A hypothetical profile is defined and evaluated using a sample diffraction signal from the obtained sample diffraction signals.

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