Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making
Reexamination Certificate
2005-12-20
2005-12-20
Walke, Amanda (Department: 1752)
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Radiation sensitive composition or product or process of making
C430S325000, C430S914000, C430S917000, C430S927000, C532S001000, C532S001000
Reexamination Certificate
active
06977131
ABSTRACT:
A radiation-sensitive patterning composition comprising:(1) at least one acid generating compound selected from the group of compounds of formulae (I) or (II):wherein R1, R2, R3, R4, R5, and R6, are individually selected from the group consisting of a hydrogen atom, nitro group, hydroxyl group, a carbonyl group, a halogen atom, a cyano group and an unsubstituted or substituted alkyl group, an unsubstituted or substituted cycloalkyl group; an unsubstituted or substituted alkoxy group, or an unsubstituted or substituted aryl group;wherein X+represents an onium ion selected from the group consisting of diazonium, iodonium, sulfonium, phosphonium, bromonium, chloronium, oxysulfoxonium, oxysulfonium, sulfoxonium, selenium, tellurium and arsenium; andwherein n is an integer from 4 to 100;(2) at least one cross-linking agent cross-linkable by an acid;(3) at least one polymer compound capable of reacting with the cross-linking agent; and(4) at least one infrared absorbing compound.
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English language machine translation of JP 10-193554.
English language machine translation of JP 2000-112136.
Interaction of a diazoresin with sodium dodecyl sulfate in aqueous solution by Hao Luo, Boxuan Yang, Lei Yang and Weiixiao Cao, College of Chemistry and Molecular Engineering. Received Jan. 26, 1998; revised Feb. 16, 1998. Macromol. Rapid Commun. 19, 291-294 (1998).
Kodak Polychrome Graphics LLC
Ratner & Prestia
Walke Amanda
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