Segmented resist islands for photolithography on single sliders

Details Segmented resist islands for photolithography on single sliders Segmented resist islands for photolithography on single sliders

2008-07-08

2008-07-08

Huff, Mark F. (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

C430S322000, C430S394000, C430S330000

Reexamination Certificate

active

07396636

ABSTRACT:
A method for creating segmented resist islands for photolithography on single sliders is disclosed. The method includes ramping the temperature of a number of single sliders, to a temperature that is below a proper softbake temperature. The single sliders reside in a divider and the single sliders and walls of the divider have a layer of resist deposited on them. Coarse lithography is then performed to remove the resist from above portions of the walls of the divider; and the temperature of the single sliders, the resist and the divider is then ramped to a proper softbake temperature.

REFERENCES:
patent: 2002/0094492 (2002-07-01), Randall et al.
patent: 2004/0250414 (2004-12-01), Lelong
patent: 2004/0265531 (2004-12-01), McKean et al.
patent: 2005/0164134 (2005-07-01), Shirley et al.
patent: 2166888 (1986-05-01), None

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