Segmented mask and exposure system for x-ray lithography

Details Segmented mask and exposure system for x-ray lithography Segmented mask and exposure system for x-ray lithography

1991-10-22

1993-08-10

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 35, 378205, 2504911, 2504922, G21K 500

Patent

active

052356264

ABSTRACT:
An x-ray lithography mask design provides for replacement of a single large area membrane with a set of smaller membranes (segments) fabricated on a single mask substrate forming a segmented mask. The segments are arranged serially so that they can be sequentially aligned and exposed by a shaped x-ray beam. Thus, the segmented mask is a series of mask membrane segments mounted together.

REFERENCES:
patent: 4260670 (1981-04-01), Burns
patent: 4451544 (1984-05-01), Kawabuchi
patent: 4791302 (1988-12-01), Nozue
patent: 4823012 (1989-04-01), Kosugi
patent: 4825086 (1989-04-01), Mueller
patent: 4856037 (1989-08-01), Mueller et al.
patent: 4861162 (1989-08-01), Ina
patent: 4939052 (1990-07-01), Nakagawa
patent: 5036209 (1991-07-01), Kataoka et al.

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