Secure photomask with blocking aperture

Details Secure photomask with blocking aperture Secure photomask with blocking aperture

2008-04-18

2010-12-14

Huff, Mark F (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

C359S275000

Reexamination Certificate

active

07851110

ABSTRACT:
A secure photomask including a substrate having one or more pattern layers formed thereon and a blocking aperture disposed below the one or more pattern layers that prevents at least one of unauthorized use and copying of the photomask.

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Zanzal, Andrew, “Benchmark Technologies and Estion Sign Distribution Agreement for Insitu Electric Field Test Reticle,” dated Feb. 13, 2009, Benchmark Technologies, Inc., Lynnfield, Massachusetts.

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