Coating apparatus – Gas or vapor deposition – Chamber seal
Patent
1998-06-05
1999-10-05
Tran, Hien
Coating apparatus
Gas or vapor deposition
Chamber seal
118718, 118719, 1562726, 156382, C23C 1600, B32B 3100
Patent
active
059617276
ABSTRACT:
In a method in which a thin-film support is continuously led into a vacuum chamber from the atmospheric air, subjected to surface treatment and led-out to the atmospheric air again, a pneumatical cutoff portion of a leading-in and leading-out section is constituted by seal roller sets each of which is formed by aligned pairs of leading-in rollers and leading-out rollers which are close to each other through slight distances, and the support is led-in and led-out while lapped at an angle of from 30 to 150 degrees around the pair of rollers nearest to the atmospheric air of the seal roller sets.
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Aiba Tadashi
Funabashi Shinichi
Nagayama Osamu
Nawano Takashi
Tsubata Hisashi
Fuji Photo Film Co. , Ltd.
Tran Hien
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