Sealing apparatus for semiconductor wafer and method of...

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor

Reexamination Certificate

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C438S015000, C438S025000, C438S026000, C438S051000, C438S055000, C438S069000, C438S112000, C438S124000, C438S126000, C438S127000, C257S787000

Reexamination Certificate

active

07109057

ABSTRACT:
A sealing apparatus for a semiconductor wafer includes an upper mold and a lower mold. The lower mold includes a recess in which the semiconductor wader is placed, and a pot for introducing resin to the recess. The pot is located under a center area of the recess. Thus, when the resin is introduced in the recess, the resin is spread from the center area of the semiconductor wafer toward the peripheral area.

REFERENCES:
patent: 4983110 (1991-01-01), Yoshida et al.
patent: 5302850 (1994-04-01), Hara
patent: 5304512 (1994-04-01), Arai et al.
patent: 6344162 (2002-02-01), Miyajima
patent: 6570261 (2003-05-01), Farquhar et al.
patent: 6630374 (2003-10-01), Yamamoto
patent: 6717297 (2004-04-01), Sadarangani et al.
patent: 2001/0042913 (2001-11-01), Fukuda et al.
patent: 404177845 (1992-06-01), None
patent: 07022451 (1995-01-01), None
patent: P2001-47459 (2001-02-01), None

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