Seal ring arrangements for immersion lithography systems

Details Seal ring arrangements for immersion lithography systems Seal ring arrangements for immersion lithography systems

2011-04-12

2011-04-12

Davis, Daborah Chacko (Department: 1722)

Photocopying

Projection printing and copying cameras

With temperature or foreign particle control

C355S053000, C430S311000

Reexamination Certificate

active

07924401

ABSTRACT:
Various seal ring arrangements for an immersion lithography system are disclosed. With the seal ring arrangements, the immersion lithography system can provide better sealing effect for processing the wafers on a wafer chuck.

REFERENCES:
patent: 7517639 (2009-04-01), Lin et al.
patent: 2004/0075895 (2004-04-01), Lin
patent: 2004/0160582 (2004-08-01), Lof et al.
patent: 2005/0264778 (2005-12-01), Lof et al.
patent: 2004289127 (2004-10-01), None
Soichi, Owa et al., “Immersion Lithography Tool Update”, Sematech 3rd Immersion Workshop, Jul. 2003, pp. 1-51.
2005-0481 JP 1st OA 20091125.

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