Chemistry of inorganic compounds – Modifying or removing component of normally gaseous mixture
Reexamination Certificate
2008-08-29
2010-11-09
Mayes, Melvin C (Department: 1793)
Chemistry of inorganic compounds
Modifying or removing component of normally gaseous mixture
C502S038000
Reexamination Certificate
active
07829046
ABSTRACT:
Scrubber media for reactive gases, that can include but are not necessarily limited to hydrogen chloride (HCl), hydrogen sulfide (H2S), hydrogen fluoride (HF), and ammonia (NH3), can include reactive particles, potentially as small as nano-scale, that can optionally be suspended on macro-scale carrier particles. Reactive gases can be converted to non-volatile compounds by being passed through a bed of such scrubber media. Such scrubber media can be used to remove reactive gases from gas mixtures. Potential applications include differential absorption spectroscopy, air pollutant emission controls, and the like. Methods of preparing scrubber media are also described.
REFERENCES:
patent: 5703003 (1997-12-01), Siriwardane
patent: 2001/0009884 (2001-07-01), Moskovitz et al.
patent: 2004/0159235 (2004-08-01), Marganski
patent: 2005/0061147 (2005-03-01), Marganski
patent: 2005/0065023 (2005-03-01), Deevi et al.
patent: 1471794 (1977-04-01), None
patent: WO 94/14525 (1994-07-01), None
patent: WO 96/23726 (1996-08-01), None
patent: WO 2004/047950 (2004-06-01), None
Li Kuo-Tseng and Cheng, Wen-Da. “Selective Oxidation of Hyrogen Sulfide over Bi-Mo catalyst”. Applied Catalysis A: General 142 (1996) 315-326.
Baum Marc M.
Feitisch Alfred
Kwan Alex
Liu Xiang
Moss John
Han Sheng
Mayes Melvin C
Mintz Levin Cohn Ferris Glovsky and Popeo P.C.
SpectraSensors, Inc.
LandOfFree
Scrubber for reactive gases does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Scrubber for reactive gases, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scrubber for reactive gases will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-4207123