Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Reexamination Certificate
2011-02-22
2011-10-18
Young, Christopher (Department: 1721)
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
C430S030000
Reexamination Certificate
active
08039180
ABSTRACT:
A method of forming a mask having optical proximity correction features, which includes the steps of obtaining a target pattern of features to be imaged, expanding—the width of the features to be imaged, modifying the mask to include assist features which are placed adjacent the edges of the features to be imaged, where the assist features have a length corresponding to the expanded width of the features to be imaged, and returning the features to be imaged from the expanded width to a width corresponding to the target pattern.
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Liebmann, et al., “Optimizing Style Options for Sub Resolution Assist Features”, Optical Microlith. XIV, C.J. Progler Proc. of SPIE, vol. 4346 (2001), pp. 141-152.
European Search Report issued in European Patent Application No. EP 04253957.7-222, dated Mar. 7, 2008.
Broeke Douglas Van Den
Chen Jang Fung
Laidig Thomas
Wampler Kurt E.
ASML Masktools B.V.
Pillsbury Winthrop Shaw & Pittman LLP
Young Christopher
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