Scanning systems for high resolution E-beam and X-ray lithograph

Details Scanning systems for high resolution E-beam and X-ray lithograph Scanning systems for high resolution E-beam and X-ray lithograph

1991-12-20

1993-11-16

Porta, David P.

X-ray or gamma ray systems or devices

Specific application

Lithography

378 84, 378 85, G21K 106

Patent

active

052630730

ABSTRACT:
Novel methods and apparatus for high resolution electron beam and X-ray lithography. For electron-beam lithography, a novel 1:1 imaging system is disclosed. For X-ray lithography, novel 1:1 imaging and n:1 reduction imaging systems are disclosed.

REFERENCES:
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patent: 4705956 (1987-11-01), Ward
patent: 4742234 (1988-05-01), Feldman et al.
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patent: 4947413 (1990-08-01), Jewell et al.
patent: 5115456 (1992-05-01), Kimura et al.
Vladimirsky, et al, "High-resolution Fresnel zone plates for soft x-rays," J. Vac. Sci. Technol. B6(1), Jan./Feb. 1988; pp. 311-315.
Ward, et al, "A 1:1 electron stepper," J. Vac. Sci. Technol. B4(1), Jan./Feb. 1986; pp. 89-93.
Kinoshita, et al, "Soft x-ray lithography using multilayer mirrors," J. Vac. Sci. Technol. B7 (6), Nov./Dec. 1989; pp. 1648-1651.

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