Scanning mechanism of an ion implanter

Details Scanning mechanism of an ion implanter Scanning mechanism of an ion implanter

2007-08-21

2007-08-21

Kim, Robert (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Analyte supports

C250S440110, C250S441110, C250S492210

Reexamination Certificate

active

11155973

ABSTRACT:
This invention discloses a scanning mechanism of an ion implanter. The mechanism is a PR-PRR type parallel mechanism with two subchains and two DOFs, driving the wafer holder to scan when the first subchain and the second subchain are translated in the same direction at the same speed and adjusting the rotational angle of the wafer holder when the first moving link (30) and the second moving link (32) in the first subchain and the second subchain have different translation amounts in the same direction or opposite directions. The driving motor for the scanning mechanism is provided outside the implant chamber. The invention also solves problems like low rigidity and large accumulation errors of existing serial scanning mechanisms and the effect of the electromagnetic field of the motor within the ion implant chamber on the trajectory of the ion beam.

REFERENCES:
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patent: 6761518 (2004-07-01), Stengele et al.
patent: 7112808 (2006-09-01), Ioannou et al.
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patent: 2005/0184253 (2005-08-01), Ioannou et al.
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patent: 2006/0163471 (2006-07-01), Zapata et al.

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