Scanning exposure method and apparatus in which a mask and a sub

Details Scanning exposure method and apparatus in which a mask and a sub Scanning exposure method and apparatus in which a mask and a sub

1998-09-23

2000-08-08

Le, Que T.

Radiant energy

Photocells; circuits and apparatus

Photocell controls its own optical systems

2502081, 250548, G01J 132

Patent

active

061005150

ABSTRACT:
An exposure apparatus for transferring a pattern formed on a mask to a photosensitive substrate is provided with an illumination optical system for illuminating a local area on the mask with a light beam, a projection optical system for projecting the pattern of the mask to the photosensitive substrate and a relative scanning device for relatively scanning the mask and the photosensitive substrate in a perpendicular direction to the optical axis of the projection optical system so as to transfer the pattern of the mask to the photosensitive substrate. The apparatus further has an adjusting device for adjusting at least one of the scanning speeds of the mask and substrate, the intensity of the light beam to be incident on the photosensitive substrate and the width of a projection area of the pattern of the mask by the projection optical system in the relative scanning direction in accordance with the change of the sensitivity characteristic of the photosensitive substrate or the change of the intensity distribution of the light beam passing a Fourier transform plane in the illumination optical system with respect to the pattern surface of the mask.

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