Scanning electron beam exposure system

Details Scanning electron beam exposure system Scanning electron beam exposure system

1982-09-27

1985-05-07

Anderson, Bruce C.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

219121EL, A61K 2702, B65G 6530, H01J 3700

Patent

active

045160309

ABSTRACT:
A scanning electron beam exposure system which comprises a main chamber (1), a subchamber (8), vacuum pumps (12, 13) and valves (10, 11, 14.about.16). The projection of an electron beam onto a workpiece within the main chamber is inhibited while an electrical or mechanical noise generated by at least one of the valves substantially exists.

REFERENCES:
patent: 3430029 (1969-02-01), Hinrichs
patent: 3612815 (1971-10-01), Henrichs
patent: 3756435 (1973-09-01), Steigerwald
patent: 4013261 (1977-03-01), Steigerwald et al.
patent: 4353160 (1982-10-01), Armini et al.

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