Scalable high dielectric constant capacitor

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

257306, 257310, 257532, H01L 27108, H01L 2941

Patent

active

057930767

ABSTRACT:
A capacitor for high density DRAM applications comprises a high-.epsilon. capacitor dielectric such as BST or PZT in an arrangement which obviates the need for barrier layers during fabrication. The fabrication process allows for electrode placement by simple sputter deposition and further provides for the possibility of capacitor spacing below that of conventional lithographic techniques.

REFERENCES:
patent: 4145803 (1979-03-01), Tasch, Jr.
patent: 4481283 (1984-11-01), Kerr et al.
patent: 4890191 (1989-12-01), Rokos
patent: 5037773 (1991-08-01), Lee et al.
patent: 5053917 (1991-10-01), Miyasaka et al.
patent: 5099305 (1992-03-01), Takenaka
patent: 5138411 (1992-08-01), Sandhu
patent: 5182232 (1993-01-01), Chhabra et al.
patent: 5187638 (1993-02-01), Sandhu et al.
patent: 5227855 (1993-07-01), Momose
patent: 5241201 (1993-08-01), Matsuo et al.
patent: 5278091 (1994-01-01), Fazan et al.
patent: 5293510 (1994-03-01), Takenaka
patent: 5349494 (1994-09-01), Ando
patent: 5366920 (1994-11-01), Yamamichi et al.
patent: 5369296 (1994-11-01), Kato
patent: 5418180 (1995-05-01), Brown
patent: 5429972 (1995-07-01), Anjum et al.
patent: 5443688 (1995-08-01), Toure et al.
patent: 5444013 (1995-08-01), Akram et al.
patent: 5495117 (1996-02-01), Larson
patent: 5555486 (1996-09-01), Kingon et al.
patent: 5595928 (1997-01-01), Lu et al.
patent: 5612082 (1997-03-01), Azuma et al.
"Hemispherical Grained Si Formation on in-situ Phosphorus Doped Amorphous-Si Electrode for 256Mb DRAM's Capacitor", Watanabe, et al., IEEE Transactions on Electron Devices, vol. 42, No. 7, Jul. 1995, pp. 1247-1254.
"Oxide Spacers", Multilevel-Interconnect Technology for VLSI and ULSI, vol. II pp. 212-214.
Matsuo et al., "Spread-Vertical-Capacitor Cell (SVC) for High-Density dRAM's" IEEE Transactions on Electron Devices, Vol. 40, No. 4, Apr., 1993, pp. 750-754.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Scalable high dielectric constant capacitor does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Scalable high dielectric constant capacitor, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Scalable high dielectric constant capacitor will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-391727

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.