Sample moving apparatus, sample moving system and semiconductor

X-ray or gamma ray systems or devices – Specific application – Lithography

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Details

414354, 414384, 2504911, 2504521, G71K 510

Patent

active

050739123

ABSTRACT:
A sample moving apparatus for positioning wafers with high accuracy, which apparatus comprises a fine adjustment actuator having a drive stroke to finely move the wafer, a fine adjustment stage driven by the fine adjustment actuator, a coarse adjustment actuator having a drive stroke to relatively coarsely move the wafer, a coarse adjustment stage driven by the coarse adjustment actuator, and a holder arrangement for attractively holding the wafer onto the wafer bearing surfaces of the respective stages. Upon selective energization of the holder arrangement of the respective stages, the wafer is moved while being attracted to the coarse adjustment stage or while being attracted to the coarse adjustment stage.

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patent: 4702565 (1987-10-01), Schilling et al.
patent: 4818169 (1989-04-01), Schram
patent: 4948330 (1990-10-01), Nomura et al.

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