Image analysis – Applications – Manufacturing or product inspection
Patent
1995-03-30
1999-09-28
Couso, Jose L.
Image analysis
Applications
Manufacturing or product inspection
382149, 382274, G06K 900
Patent
active
059601060
ABSTRACT:
In a method of inspecting a sample on which a pattern relating to fabrication of a semiconductor device is formed, there are provided a light radiation unit, an acquiring unit, a storage unit, a template, a calculation unit, a correction unit, a defect detection unit and an output unit. Pinhole shape data to be detected of the pattern is stored in the template. The calculation unit calculates the degree of coincidence between the pinhole shape data stored in the template and the measured image data stored in the storage unit in units of a predetermined amount of data. The correction unit corrects a portion of the measured image data corresponding to a value of the degree of coincidence exceeding a second predetermined value in units of the predetermined amount of data, when the degree of coincidence obtained by the calculation unit has exceeded a first predetermined value, thereby correcting the portion of the measured image data including the detected pinhole. The defect detection unit detects a defect in the pattern on the basis of the corrected measured image data portion including the pinhole, which is obtained by the correcting unit, and the measured image data.
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Recticle, Mask Defect Inspection System, Densi Zairyo, pp. 55-59, Toru Azuma, Jun. 1982.
Kobayashi Eiichi
Tabata Mitsuo
Tojo Toru
Tsuchiya Hideo
Watanabe Toshiyuki
Couso Jose L.
Kabushiki Kaisha Toshiba
Werner Brian P.
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