Sample dimension measuring method and scanning electron...

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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C250S311000, C250S492200, C250S492300, C324S754120

Reexamination Certificate

active

07910886

ABSTRACT:
An object of the present invention is to suppress measurement errors caused by the fact that the shrink amount due to scan of an electron beam differs pattern by pattern. To accomplish this object, according to the invention, functions indicative of a process of change of pattern dimension when the electron beam is irradiated on a sample are prepared in respect of the kinds of sample patterns, and dimension values of a particular pattern measured by scanning the electron beam on the particular pattern are fitted to a function prepared for the particular pattern to calculate a dimension of the particular pattern before it changes.

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patent: 2004/0084619 (2004-05-01), Hartig et al.
patent: 2008/0100832 (2008-05-01), Sato et al.
patent: 2008/0179517 (2008-07-01), Kawada et al.
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patent: 09-166428 (1997-06-01), None
patent: 11-94531 (1999-04-01), None
patent: 11-237230 (1999-08-01), None
patent: WO 03/021186 (2003-03-01), None

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