Salt suitable for an acid generator and a chemically...

Details Salt suitable for an acid generator and a chemically... Salt suitable for an acid generator and a chemically...

2007-06-04

2009-08-25

Chu, John S (Department: 1795)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

C430S905000, C430S907000, C430S910000, C430S921000, C430S922000, C560S126000, C562S109000, C562S113000

Reexamination Certificate

active

07579132

ABSTRACT:
The present invention provides a salt represented by the formula (I):wherein X represents an n-valent connecting group, Y1and Y2each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, n represents 2 or 3, and A+represents an organic counter ion.The present invention further provides a chemically amplified resist composition comprising the salt represented by the above-mentioned formula (I).

REFERENCES:
patent: 6383713 (2002-05-01), Uetani et al.
patent: 6548221 (2003-04-01), Uetani et al.
patent: 7301047 (2007-11-01), Yoshida et al.
patent: 7304175 (2007-12-01), Harada et al.
patent: 2003/0194639 (2003-10-01), Miya et al.
patent: 2007/0100158 (2007-05-01), Harada et al.
patent: 2007/0100159 (2007-05-01), Yoshida et al.
patent: 2007/0122750 (2007-05-01), Yamaguchi et al.
patent: 2004-117959 (2004-04-01), None

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