Safety mechanism for a lithographic patterning device

Details Safety mechanism for a lithographic patterning device Safety mechanism for a lithographic patterning device

2006-08-01

2006-08-01

Perkey, W. B. (Department: 2851)

Photocopying

Projection printing and copying cameras

Detailed holder for original

C355S072000

Reexamination Certificate

active

07084961

ABSTRACT:
A lithographic apparatus equipped with a patterning device safety mechanism, is presented herein. In one embodiment, the apparatus comprises an illumination system for providing a beam of radiation, a support structure for supporting a patterning device that serves to impart the beam of radiation with a pattern in its cross-section, a substrate holder for holding a substrate having a plurality of target portions, a projection system for projecting the patterned beam onto the substrate target portions, a connector for securing the patterning device relative to the support structure; and a safety mechanism configured to reduce uncontrolled displacement of the patterning device in case of failure of the connector.

REFERENCES:
patent: 4194836 (1980-03-01), Rapp et al.
patent: 5682228 (1997-10-01), Miyake
patent: 5844666 (1998-12-01), Van Engelen et al.
patent: 5980187 (1999-11-01), Verhovsky
patent: 6211945 (2001-04-01), Baxter et al.
patent: 6414744 (2002-07-01), Kuiper et al.
patent: 6630988 (2003-10-01), Greene et al.
patent: 2003/0025893 (2003-02-01), Nishi
patent: 2003/0227605 (2003-12-01), del Puerto et al.
patent: 2004/0027551 (2004-02-01), Barringer et al.
patent: 2004/0027552 (2004-02-01), Kikuchi et al.
patent: 2004/0046947 (2004-03-01), Yuan et al.
patent: 2004/0057030 (2004-03-01), Okubo et al.
patent: 2004/0080730 (2004-04-01), Binnard

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