Safe liquid source containers

Gas and liquid contact apparatus – Contact devices – Liquid tank

Reexamination Certificate

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Details

C261S124000, C261SDIG065, C118S726000

Reexamination Certificate

active

10674651

ABSTRACT:
Containers for providing vapor phase reactant from liquid sources include bubbler designs and designs in which carrier gas flows over the liquid surface. Among the bubbler arrangements, a bypass conductance is provided to release excess pressure from the gas volume inside the container, or an enlarged bubbler tube is provided with a volume sufficient to accommodate all possible liquid backflow without having the liquid exit the container. Among the overflow designs, flow dividers provide a tortuous path for the gas to increase the time exposure of carrier gas packets to the evaporating liquid surface. The flow dividers can be microporous to encourage capillary action, thereby increasing the evaporating surface. The tortuous gas flow path can be separated from the liquid phase by a breathable semi-porous membrane that permits vapor phase reactant to pass through but prohibits liquid from passing in the other direction.

REFERENCES:
patent: 1103789 (1914-07-01), Macey
patent: 2206688 (1940-07-01), Bloomheart
patent: 2333898 (1943-11-01), Stevenson et al.
patent: 3957467 (1976-05-01), Kim
patent: 3989477 (1976-11-01), Wilson et al.
patent: 4389973 (1983-06-01), Suntola et al.
patent: 4393013 (1983-07-01), McMenamin
patent: 4436674 (1984-03-01), McMenamin
patent: 4548138 (1985-10-01), Korenberg
patent: 4783343 (1988-11-01), Sato
patent: 4883362 (1989-11-01), Gärtner et al.
patent: 4904419 (1990-02-01), Reynolds
patent: 4911101 (1990-03-01), Ballingall et al.
patent: 4947790 (1990-08-01), Gärtner et al.
patent: 5385689 (1995-01-01), Tom et al.
patent: 5543043 (1996-08-01), Bates et al.
patent: 5551278 (1996-09-01), Rounbehler et al.
patent: 5674574 (1997-10-01), Atwell et al.
patent: 5698037 (1997-12-01), Stauffer
patent: 5904771 (1999-05-01), Tasaki et al.
patent: 6033493 (2000-03-01), Hertz et al.
patent: 6132492 (2000-10-01), Hultquist et al.
patent: 6220091 (2001-04-01), Chen et al.
patent: 6231641 (2001-05-01), Utigard et al.
patent: 6270839 (2001-08-01), Onoe et al.
patent: 6325017 (2001-12-01), DeBoer et al.
patent: 2001/0042523 (2001-11-01), Kesala
patent: 2003/0053799 (2003-03-01), Lei
patent: 33 39 625 (1991-01-01), None
patent: 2 151 662 (1985-07-01), None
patent: 011 168092 (1999-06-01), None
Suntola, “Atomic layer epitaxy,”Thin Solid Films, 216: 84-89 (1992).
Leskelä et al., “ALS precursor chemistry: Evolution and future challenges,”Journal de PhysiqueIV France 9, 837-852 (1999).
Smith, J.M.,Chemical Engineering Kinetics, 3rdEdition, McGraw-Hill Book Company, p. 268-291 (1981).
Smith, J.M.,Chemical Engineering Kinetics, 3rdEdition, McGraw-Hill Book Company, p. 554-563 (1981).

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